Isoelectronic CdTe-doped ZnO thin films grown by PLD


MaterialsLetters139(2015)352–354
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MaterialsLetters
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IsoelectronicCdTe-dopedZnOthin lmsgrownbyPLD
E.A.Martín-Tovara,R.Castro-Rodrígueza,A.Iribarrenb,n
ab
DepartamentodeFísicaAplicada,CINVESTAV-IPN,UnidadMérida,97310,Mérida,Yucatán,México
InstitutodeCienciayTecnologíadeMateriales(IMRE),UniversidaddeLaHabana,ZapatayG,Vedado,LaHabana10400,Cuba
articleinfo
Articlehistory:
Received29August2014Accepted13October2014
Availableonline22October2014Keywords:
IsoelectronicdopingZnO
Thin lm
Pulselaserdeposition
abstract
IsoelectronicCdTe-dopedZnOthin lmsweregrownbythepulselaserdeposition(PLD)techniqueusingtargetsofZnOmixedwithCdTe.X-raydiffractionshowsasingle-phasehexagonalofZnOwurtzitestructure.X-rayphotoelectronspectroscopyshowstheformationofZn–Tebonds,whichdemonstratestheoccupationofOvacanciesbyTeatomsintheZnOlattice,althoughCd–TeandTe–Obondswerealsopresent.Elementalanalysisofthe lmsgaveCdconcentrationlowerthan2%intheZnO lm,likelyduetolowCdsolidsolubilityinZnO.Crystallitesize, lmthickness,chemicalconcentrationsandmorphologiccharacteristicsarealsoreported.
&2014ElsevierB.V.Allrightsreserved.
1.Introduction
NowadaystheinterestinZnOremainsduetotheirperspectiveapplicationsin eldsofscienceandtechnologyasoptoelectronics,photovoltaics,sensors,catalysts,piezoelectricity,electro-opticaldevices.Inthesameway,ZnOhasbeenobtainedbyalotofdifferenttechniques[1–5].ZnOhasbeenreportedtohavebandgapenergybetween3.2and3.37eV[6]andalarge60meVexcitonbindingenergy.ItswidebandgapmakesZnOagoodcandidateforUVandbluewavelengthphotonicapplicationsandtheelectricandgas-interactingsurfacepropertiesasagassensoramongotherapplications[7–10],whichhavestimulatedthecontinuityofthestudiesofthismaterialanditsapplications.
NaturallyZnOhasn-typeconductivityduetoOvacanciesandinterstitialZn,althoughZnvacanciesarealsopresent[6].Suchdefectsmakeitdif culttopreparep-typeZnO.Onewayoftryingtopassivatethesedefectsisbyisoelectronicdoping,whichcanbeconsideredasamethodforpassivatingandreducingthedefectconcentration,speci callyvacancies,intheZnOlattice.SeveralelementhavebeenusedforZnOdoping,butfewworkshasbeencarriedoutusingTeatoms[6,11,12].TelluriumandcadmiumatomshavetheadvantagesofbeingisovalentrespectOandZn,respectively.Theycanbeconsideredaspassivatingatomsthatcanalsochangethebandgap[10,13]andtheconductivity[14]inZnO.
TheeffectofCdandTedopingcanconstituteanintermediateorparallelmethodforattainingp-typeZnOusingotherco-dopantelementasnitrogen[11].InthisworkisoelectronicCdandTedopedZnO lmsweregrownbythepulselaserdeposition(PLD)
technique.Structural,morphologicalandchemicalanalysesofthe lmswerecarriedout.
2.Experimental
ZnOthin lmwasdepositedonITO/glasssubstratesusingaNd:YAG-laseroperatingintheQ-switchmodewithenergydensityatthetarget$2J/cm2.Thetargetwasasoliddiskof4.65mmthickand8.05mmdiametermadeupofamixtureofZnOnanoparticles(99.99%Aldrich)withadditionof30wt.%ofCdTe(99.99%Aldrich),whichweremilled,pressedat10Tfor5minandsinteredat6001Cfor2h.The lmsweredepositedatsubstratetemperatureTs¼3001Cinvacuum$1.3Â10À7Paand3000lasershots.ThestructuralpropertiesweredeterminedusingaD5000SiemensX-raydiffractometer.Thethicknessofthe lmswasmeasuredbyaSurfacePro lometerDektak-8,Veeco.Elementalanalysisofthe lmswascarriedoutbyenergydispersivespectroscopy(EDS)withaJEOLJSM7600Fscanningelectronmicroscope.X-rayphoto-electronspectroscopy(XPS)analyseswereperformedinaK-ALPHAThermoScienti cSystem.
3.Resultsanddiscussion
TheCdTe-dopedZnO lmshadthicknessof$112nm,similartothoseofundopedZnO.
Theobserveddiffractionpeaksforboth lmsarewurtziteZnOphase[15],andpreferentialorientationintheplane(002).AllthepeaksareshiftedtotheleftwithrespecttothepositionoftheZnOpowderstandardpattern,whichindicatestensilestress.From(100),(002)and(101)peaks,theaveragegrainsizecalculated
n
Correspondingauthor.
E-mailaddresses:augusto@imre.oc.uh.cu,a_iribarren@yahoo.com(A.Iribarren).
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